@article{oai:repository.lib.tottori-u.ac.jp:00001380,
 author = {橋本, 隆 and 大嘉, 徳男 and Hashimoto, Takashi and Oka, Norio},
 issue = {1},
 journal = {鳥取大学教育学部研究報告. 自然科学, The Journal of the Faculty of Education, Tottori University. Natural science},
 month = {Jun},
 note = {Changes in magnetic anisotropy and the electrical resistivity during annealing are measured to investigate the mechanism of the stress relief in nickel films. It is found that the annealing processes of the magnetic anisotropy and the electrical resistivity have nearly the same activation energies. An analysis of the data indicates that the activation energies associated with the relief of the residual stress is explained in terms of grain boundary diffusion.},
 pages = {1--10},
 title = {斜め蒸着ニッケル薄膜中の残留応力の緩和},
 volume = {29},
 year = {1979},
 yomi = {ハシモト, タカシ and オオカ, ノリオ and ハシモト, タカシ and オオカ, ノリオ}
}