{"created":"2023-08-02T03:52:40.810237+00:00","id":1380,"links":{},"metadata":{"_buckets":{"deposit":"03c8c4cc-d997-4a19-89fa-3f3cfac99365"},"_deposit":{"created_by":10,"id":"1380","owners":[10],"pid":{"revision_id":0,"type":"depid","value":"1380"},"status":"published"},"_oai":{"id":"oai:repository.lib.tottori-u.ac.jp:00001380","sets":["1:6","2:14","23:38:54:331:332"]},"author_link":["32737","32738","32739","32740"],"item_3_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1979-06-30","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"10","bibliographicPageStart":"1","bibliographicVolumeNumber":"29","bibliographic_titles":[{"bibliographic_title":"鳥取大学教育学部研究報告. 自然科学","bibliographic_titleLang":"ja"},{"bibliographic_title":"The Journal of the Faculty of Education, Tottori University. Natural science","bibliographic_titleLang":"en"}]}]},"item_3_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Changes in magnetic anisotropy and the electrical resistivity during annealing are measured to investigate the mechanism of the stress relief in nickel films. It is found that the annealing processes of the magnetic anisotropy and the electrical resistivity have nearly the same activation energies. An analysis of the data indicates that the activation energies associated with the relief of the residual stress is explained in terms of grain boundary diffusion.","subitem_description_type":"Other"}]},"item_3_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"鳥取大学教育学部"}]},"item_3_relation_16":{"attribute_name":"情報源","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"鳥取大学教育学部研究報告. 自然科学. 1979. 29(1), 1-10."}]}]},"item_3_rights_15":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"注があるものを除き、この著作物は日本国著作権法により保護されています。 / This work is protected under Japanese Copyright Law unless otherwise noted."}]},"item_3_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00174585","subitem_source_identifier_type":"NCID"}]},"item_3_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"03715965","subitem_source_identifier_type":"ISSN"}]},"item_3_text_33":{"attribute_name":"著者所属（英）","attribute_value_mlt":[{"subitem_text_language":"en","subitem_text_value":"Laboratory of Physics, Faculty of Education, Tottori University."},{"subitem_text_language":"en","subitem_text_value":"Laboratory of Physics, Faculty of Education, Tottori University."}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"橋本, 隆"},{"creatorName":"ハシモト, タカシ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"大嘉, 徳男"},{"creatorName":"オオカ, ノリオ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Hashimoto, Takashi","creatorNameLang":"en"},{"creatorName":"ハシモト, タカシ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Oka, Norio","creatorNameLang":"en"},{"creatorName":"オオカ, ノリオ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper"}]},"item_title":"斜め蒸着ニッケル薄膜中の残留応力の緩和","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"斜め蒸着ニッケル薄膜中の残留応力の緩和","subitem_title_language":"ja"},{"subitem_title":"Relief of Residual Stress in Nickel Films Evaporated at Oblique Incidence","subitem_title_language":"en"}]},"item_type_id":"3","owner":"10","path":["6","14","332","1712112934794"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2021-11-25"},"publish_date":"2021-11-25","publish_status":"0","recid":"1380","relation_version_is_last":true,"title":["斜め蒸着ニッケル薄膜中の残留応力の緩和"],"weko_creator_id":"10","weko_shared_id":-1},"updated":"2024-04-04T00:34:14.534031+00:00"}