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  1. 学部学科区分一覧
  2. 工学部・工学研究科
  1. 資料タイプ一覧
  2. 紀要論文
  1. 鳥取大学の刊行物
  2. 鳥取大学大学院工学研究科/工学部研究報告
  3. 3

RFスパッタリング法によるタンタル薄膜の生成

https://repository.lib.tottori-u.ac.jp/records/3456
https://repository.lib.tottori-u.ac.jp/records/3456
87bee398-ce69-4d09-858c-bfe6536b6c88
名前 / ファイル ライセンス アクション
rfteu3(2)_90.pdf rfteu3(2)_90.pdf (650.2 kB)
注があるものを除き、この著作物は日本国著作権法により保護されています。 / This work is protected under Japanese Copyright Law unless otherwise noted.
Item type 紀要論文 / Departmental Bulletin Paper(1)
公開日 2018-06-22
タイトル
タイトル RFスパッタリング法によるタンタル薄膜の生成
タイトル
言語 en
タイトル Preparation of Ta Thin Films by RF Sputtering Method
言語
言語 jpn
資源タイプ
資源タイプ departmental bulletin paper
タイトル(ヨミ)
その他のタイトル RF スパッタリング ホウ ニヨル タンタル ハクマク ノ セイセイ
著者 小林, 洋志

× 小林, 洋志

WEKO 1614
e-Rad 40029450

小林, 洋志

ja-Kana コバヤシ, ヒロシ

en Kobayashi, Hiroshi

Search repository
岸田, 庸子

× 岸田, 庸子

WEKO 33936

岸田, 庸子

ja-Kana キシダ, ヨウコ

Search repository
熊谷, 直樹

× 熊谷, 直樹

WEKO 33937

熊谷, 直樹

ja-Kana クマガヤ, ナオキ

Search repository
笹倉, 博

× 笹倉, 博

WEKO 3187
e-Rad 50032264

笹倉, 博

ja-Kana ササクラ, ヒロシ

en Sasakura, Hiroshi

Search repository
Kishida, Yoko

× Kishida, Yoko

WEKO 33938

en Kishida, Yoko

ja-Kana キシダ, ヨウコ

Search repository
Kumagaya, Naoki

× Kumagaya, Naoki

WEKO 33939

en Kumagaya, Naoki

ja-Kana クマガヤ, ナオキ

Search repository
著者所属
電子工学科 Department of Electronics
著者所属
電子工学科 Department of Electronics
著者所属
現在神戸大学工学部電気工学科Present adddress, Department of Electrical Engineering, Fuculty of Engineering, Kobe University.
著者所属
電子工学科 Department of Electronics
抄録
内容記述タイプ Abstract
内容記述 Ta thin films are prepared by sputtering under various conditions. Ar gas pressure during sputtering is in the range of l×10⁻³~1×10⁻² torr. Either α―Ta(b. C. C.) similar tO a bulk or β―Ta (tetragonal) obtained only on a film is deposited. It appears that α―Ta is formed in a contaminative atomosPhere, while β―Ta is formed in a clean atomosphere. The α or β Ta phase Of the sputtered films is determined by X―ray diffraction pattern or by measuring the specific resistivity. The α―Ta films show the main peak of the (110) plane parallel to the glass substrate and the β―Ta films show the main peak of the(200) plane parallel to the glass substrate. The X―ray oscillation Photographs also show that both the α―Ta and the β―Ta have fibre structures. Specific resistivities of the α―Ta and the β―Ta are 50~100 μΩ―cm and 180 ~230 μΩ-cm, respectively.
書誌情報 鳥取大学工学部研究報告
en : Reports of the Faculty of Engineering, Tottori University

巻 3, 号 2, p. 90-98, 発行日 1973-03-20
出版者
出版者 鳥取大学工学部
ISSN
収録物識別子タイプ ISSN
収録物識別子 03858596
書誌レコードID
収録物識別子タイプ NCID
収録物識別子 AN00174610
権利
権利情報 注があるものを除き、この著作物は日本国著作権法により保護されています。 / This work is protected under Japanese Copyright Law unless otherwise noted.
情報源
関連名称 鳥取大学工学部研究報告. 1973, 3(2), 90-98
著者版フラグ
出版タイプ VoR
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